Laser-assisted atom probe tomography of oxide materials

Oberdorfer C, Stender P, Reinke C, Schmitz G

Research article (journal) | Peer reviewed

Abstract

Atom probe tomography provides a chemical analysis of nanostructured materials with outstanding resolution. However, due to the process of field evaporation triggered by nanosecond high voltage pulses, the method is usually limited to conductive materials. As part of recent efforts to overcome this limitation, it is demonstrated that the analysis of thick NiO and WO3 oxide layers is possible by laser pulses of 500 ps duration. A careful analysis of the mass spectra demonstrates that the expected stoichicimetries are well reproduced by the measurement. The reconstruction of lattice planes proves that surface diffusion is negligible also in the case of thermal pulses.

Details about the publication

JournalMicroscopy and Microanalysis
Volume13
Issue5
Page range342-346
StatusPublished
Release year2007 (31/10/2007)
Language in which the publication is writtenEnglish
DOI10.1017/S1431927607070274
Keywordslaser-assisted atom probe tomography compositional analysis tungsten oxide nickel oxide thermal pulsing thin films field-induced oxidation field-ion microscopy specimens

Authors from the University of Münster

Oberdorfer, Christian
Institute of Materials Physics
Schmitz, Guido
Institute of Materials Physics
Stender, Patrick
Institute of Materials Physics