Laser-assisted atom probe tomography of oxide materials

Oberdorfer C, Stender P, Reinke C, Schmitz G

Forschungsartikel (Zeitschrift) | Peer reviewed

Zusammenfassung

Atom probe tomography provides a chemical analysis of nanostructured materials with outstanding resolution. However, due to the process of field evaporation triggered by nanosecond high voltage pulses, the method is usually limited to conductive materials. As part of recent efforts to overcome this limitation, it is demonstrated that the analysis of thick NiO and WO3 oxide layers is possible by laser pulses of 500 ps duration. A careful analysis of the mass spectra demonstrates that the expected stoichicimetries are well reproduced by the measurement. The reconstruction of lattice planes proves that surface diffusion is negligible also in the case of thermal pulses.

Details zur Publikation

FachzeitschriftMicroscopy and Microanalysis
Jahrgang / Bandnr. / Volume13
Ausgabe / Heftnr. / Issue5
Seitenbereich342-346
StatusVeröffentlicht
Veröffentlichungsjahr2007 (31.10.2007)
Sprache, in der die Publikation verfasst istEnglisch
DOI10.1017/S1431927607070274
Stichwörterlaser-assisted atom probe tomography compositional analysis tungsten oxide nickel oxide thermal pulsing thin films field-induced oxidation field-ion microscopy specimens

Autor*innen der Universität Münster

Oberdorfer, Christian
Institut für Materialphysik
Schmitz, Guido
Institut für Materialphysik
Stender, Patrick
Institut für Materialphysik